场发射扫描电镜介绍.pptVIP

* * * * A specimen is inserted into the specimen chamber through the airlock chamber with JEOL patented One Action Specimen Exchange. Contamination on a specimen is minimized since the specimen chamber is always kept at high vacuum. * * A specimen is inserted into the specimen chamber through the airlock chamber with JEOL patented One Action Specimen Exchange. Contamination on a specimen is minimized since the specimen chamber is always kept at high vacuum. * * * * * * * * This image was observed in the Gentle Beam mode. The Gentle Beam can produce excellent resolution at very low voltages for observation of fine surface structures. * * * * This is a spectrum of electrons emitted from a specimen. The electrons below 50eV is called secondary electron. * * The r-filter is housed in the objective lens yoke. Static potentials on the four sets of electrodes are adjusted to select certain range of electrons. * * * * This is the windows for the r-filter setting. * * * * * * Gold Labeled Cells Specimen courtesy of Dr. Hyatt, CSIRO, Australia Secondary electron image SE Mode Backscattered electron image Secondary electron image with Sb Mode r能量过滤—成像模式及信息 当前第30页\共有45页\编于星期六\3点 SE Bs BE 样品:钛酸钡陶瓷 2 kV 6,000 X r能量过滤—成像模式及信息 当前第31页\共有45页\编于星期六\3点 在高加速电压下呈“透明”状的样品也能观察其表面 石墨烯 极低加速电压图像 80 V 当前第32页\共有45页\编于星期六\3点 空间尺寸 15kV 1.5mm 5kV 0.2mm 分析区域的空间尺寸，不仅是束斑尺寸， 还包括电子散射的区域。 低加速电压下，散射区域明显缩小。 Specimen: Al 当前第33页\共有45页\编于星期六\3点 RBEI WDS RTED EDS LNT EDS EBSD LNT 俯视图 侧视图 front EBSD 优化的样品室接口位置设计 当前第34页\共有45页\编于星期六\3点 高速元素Mapping(EDS) 5kV, 110nA, 1min Specimen: Melting pot 当前第35页\共有45页\编于星期六\3点 测试时间60秒 （实时） JEOL Only 彩色面分布 样品:贴片电容截面 测试倍率：x10,000 加速电压：5kV 探针电流：50nA 用定性图谱的测试时间可进行元素面分布 用低加速电压可在短时间内进行高空间分辨率的元素面分布测试 高速元素Mapping(EDS) 当前第36页\共有45页\编于星期六\3点 EBSD高精度晶体取向分析 ND TD 也适合于磁性材料的高精度晶体取向分析 分析点: 118585 尺寸: X Max: 80.00 μm Y Max: 79.89 μm 步长: 0.25 μm 相: Nd2Fe14B 铁钕硼 当前第37页\共有45页\编于星期六\3点 日本电子场发射扫描电镜 JSM-7500F JSM-7100F JSM-7610F JSM-7800F 当前第38页\共有45页\编于星期六\3点 JSM-7800F