HORIBA堀场产品样本技术资料-高灵敏度二氧化硅监测仪SLIA-300 HAE-T0067.pdf

For ultra-pure water manaement in semiconductor and FPD processes High Sensitivity Silica Monitor SLIA-300 High sensitivity in a compact body for silica analysis of ultra-pure water The silica concentration in ultra-pure water has an enormous influence on product accuracy and yields in semiconductor and FPD processes. The SLIA-300 High Sensitivity Silica Monitor perfectly meets the need in these industries for measurement below 1 μg/L (1 ppb). It is capable of highly sensitive measurement throughout the full measurement range in a compact, desktop unit. Complete with the highly-reputed basic features, such as high-speed response and self-diagnosis, it boasts performance that takes sensitivity to a new level. The SLIA-300 provides the support you need when it comes to pure-water processes in the fabrication of semiconductors and FPDs. Features High sensitivity and high repeatability Up to 6-point measurement possible (option) Employing newly-developed, unique cell technol-ogy, Supporting multi-point measurement, a single SLIA-300 is able to the SLIA-300 achieves high sensitivity for handling measure more points. Set anywhere between one and six points. measurements at low concentrations. With a high-speed Self-diagnosis function checks for running errors measurement of five minutes, it guarantees ±2% of full-scale repeatability in a range of 0 to 2 μg/L. This function monitors and self-diagnoses operational errors relating to sample water and reagent injection, calibration, cell Desktop-type compact design temperature, and lamp operation. If an error arises, the warning lamp illuminates and a